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tantalum ball is a flammable, dark gray powder used in applications such as sputtering targets and alloys. It has a low density and a large surface area. It can be used in 3D printing and electrolytic capacitors.

Various tantalum powder types are available. These include nodular, spherical and EB powders. They are suitable for sputtering targets, machining and 3D printing. They are ROHS and EICC compliant.

Spherical tantalum powder is produced by plasma atomization with an inert gas such as argon, helium or hydrogen. Its particles have a nearly spherical shape with a relatively smooth surface and narrow particle size distribution, all important for excellent flow and compact packaging.

Plasma-treated tantalum powder can be nitrogen doped or otherwise doped in any quantity. It can have a nitrogen content of from 5 ppm to 5,000 ppm or more.

The starting tantalum powder, prior to the plasma treatment, can have a first particle size distribution and a second particle size distribution. The first particle size distribution is a uniform range, or a non-uniform range that includes from about 0.1 to about 20 microns, and the second particle size distribution is within 15% of the first distribution, within 10% of the first distribution, or within 5% of the first distribution.

The plasma-treated tantalum powder can have a bulk density of from about 0.8 to 2.0 g/cm(3), preferably 0.8 to 1.8 g/cm(3). It can have a Hall flow rate of from about 19 seconds to about 15 seconds, preferably 4 seconds or less.

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