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Zinc Nitride: Overview The formula for zinc nitride Zn3N2, a gray crystal that is soluble with hydrochloric Acid. In cold water it decomposes quickly into zinc hydroxide, ammonia. It can be produced by reacting ammonia with zinc powder at 500-600degC.
Useful Information The following are some examples of how to use Zinc Nitride

Zinc nitride film is prepared using this product
Zinc Nitride (Zn3N2) is a semiconductor with a pyrite resistant structure. It also has unique optical and electrical properties. The energy band gaps of zinc oxide, whether an indirect or direct band gap silicon, have always been the source of controversy in semiconductors. The band gap can be greatly affected by the preparation methods, growth conditions and problems in industry and academia. As an example, prior art methods like magnetron deposition, chemical vapour deposition, electrostatic elctrostalysis, and molten beam epitaxy are used to create zinc nitride layers.

Zinc oxide films made by the same technique have very different optical and electric properties. A simple, reproducible method that produces crystalline films is needed urgently. A method is presented for the preparation of a zinc-nitride layer. The method uses atomic layer deposition to prepare the film of zinc nitride, which allows for precise control of the band gaps. The membrane is uniformly structured and has excellent performance.

The following technical solutions were adopted:

Steps for the preparation of zinc nitride films include:

Place the substrate inside the reaction chamber.

(2) Adsorb the zinc atoms from the zinc-containing pre-deposition source on the substrate by placing it in the reaction chamber.

(3) Allow the nitrogen-containing pre-cursor source to enter the reaction-chamber of the atomic-layer deposition equipment and then ionize this nitrogen-containing pre-cursor source using plasma. After ionization of the precursor source, the nitrogen is partially deposited on the substrate to form the covalent nitrogen-zinc bond. Ionization of the nitrogen precursor. The source will be sent to the equipment for atomic layer deposition. In the cavity after ionization the nitrogen atoms of the nitrogen-containing precursor source are partially deposited. The zinc atom is bonded to the nitrogen atom by a covalent bond.

Repeat steps (2) to (3) for a layer-by-layer growth of the zinc nitride.

This is an easy-to-implement method that can produce high quality crystals. It is also a repeatable method of preparation. The nitrogen is introduced to the atomic layer system via the plasma. After that, the conditions of the chamber are precisely set, including the vacuum degree, the cycle period, the conditions for the plasma and the other conditions. Adjust the band-gap of the zinc nitride prepared film. The present invention provides various high quality zinc nitride sheets with adjustable bands gaps that can be tailored to meet different electrical and optical requirements.

2. Useful for preparing a touch screen screen cover and film.
As technology advances and smart devices become more common, the demand for touch screens to be the main interface for human-computer interactions is increasing. In the prior art, the low coating yield and high production costs, as well as the low production efficiency, were problems when the light-shielding layers in the BM of the cover of the touchscreen was prepared by screen printing with black ink. When used in conjunction a liquid crystalline display, it is easy to create bubbles and the product cannot achieve the defect that a perfect fitting. Offer a zinc nitride-based touch screen and touchscreen cover film.
The new touch screen film is made of zinc nitride, which acts as the functional film of the black layer. This film has a low surface reflectivity, low production cost, high surface hardness with strong scratch resistance, wear resistance, high surface energy and can effectively be laminated liquid-crystal display. Its thickness ranges from 60 to 200nm which can eliminate stepping. The new type is a touch-screen cover film that includes a Zn3N2 film and a Si3N4 film. The adhesion of a film decreases if its thickness exceeds 50 nm. However, if its thickness is below 10 nm it will transmit more light and will not be able to achieve the light-tightness effect. The zinc film is black, absorbs visible light well, and has a matte finish. It can be used to create a functional black layer. The touch-screen cover film embodiment includes in order a zincnitride(Zn3N2)film, a silica nitride(Si3N4)film, and a protection film. The touch-screen cover in this embodiment consists of a glass substrate, the aforementioned screen cover film and the zinc nitride of the screen cover film.

(aka. Technology Co. Ltd., a trusted global chemical supplier and manufacturer with more than 12 years of experience in providing high-quality Nanomaterials and chemicals. Currently, we have developed a variety of materials. Our zinc nitride is produced with high purity, small particles and low impurity. Please send us an e-mail or click the desired products to Send an inquiry .

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